Canon Inc. Releases FPA-3030i6 Semiconductor Lithography System for Small Wafers

Newly developed lens and a variety of options to meet the growing demand for power devices

MELVILLE, N.Y., Oct. 04, 2024 (GLOBE NEWSWIRE) — Canon Inc., the parent company of Canon U.S.A., Inc., a leader in digital imaging solutions, announced the release of the FPA-3030i6 i-line¹ stepper, a new semiconductor lithography system for processing wafers with a diameter of 8 inches (200 mm) or smaller.

The FPA-3030i6 system employs a newly developed projection lens that works to help reduce lens aberration for high exposure dose processes² and improve productivity by shortening exposure time.

The full release from Canon Inc. can be found here.

Optional products including a wafer handling system for special substrates are available for order to meet users’ manufacturing needs for various emerging semiconductor devices including high-power and high-efficiency devices.

The FPA-3030i6 semiconductor lithography system is designed to support a wide range of device fabrication thanks to a variety of available process options for silicon, as well as sapphire and compound semiconductor materials.

Canon will offer wafer feeding options enabling handling of substrates from 2 inches (50 mm) to 8 inches (200 mm) in diameter, as well as thick, thin and warped substrate handling.

About Canon U.S.A., Inc.

Canon U.S.A., Inc. is a leading provider of consumer, business-to-business, and industrial digital imaging solutions to the United States and to Latin America and the Caribbean markets. With approximately $29.4 billion in global revenue, its parent company, Canon Inc. as of 2023 has ranked in the top-five overall in U.S. patents granted for 38 consecutive years^†. Canon U.S.A. is dedicated to its Kyosei philosophy of social and environmental responsibility. To learn more about Canon, visit us at www.usa.canon.com and connect with us on LinkedIn at https://www.linkedin.com/company/canonusa.

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^† Based on weekly patent counts issued by United States Patent and Trademark Office.

¹ Semiconductor lithography equipment using i-line (Mercury lamp, wavelength 365 nm) light source
 1 nm (nanometer) =1/1 billion meter.

² Under Canon’s standard exposure conditions

Specifications and availability subject to change without notice.

Attachment

• FPA-3030i6

CONTACT: Brian Bohl
Canon U.S.A., Inc.
516-408-8214
bbohl@cusa.canon.com